Research Interests

The Pease group is actively researching the following areas:

Multiple-axis Electron Beam Lithography		Dan Pickard

Surface Characterization of Negative Electron Affinity Photocathodes		Zhi Liu

Photonic A/D Converters (FEAT)		Rafael Aldana

Lamellar Crystallization of Silicon for 3DICs		Dan Witte

Nano-graphoepitaxy of Silicon for 3DICs		Filip Crnogorac

Shot Noise Effects in Electron/Ion Beam Lithography		Bing Dai

And these are some of the previous research topics studied in the Pease group:

E-beam Resist Charging		Min Bai

E-beam Resist Heating		Dachen Chu

Turnstile Single Electron Emitters		Alireza Nojeh

Residual layer control and functional pattern generation in MxL		Tetsuhiro (Hiro) Hatogai

Micromachined Tunneling Transistors		Kevin Gilbert

Silicon Nanopillars		Theresa Kramer

Sequential 3D IC fabrication		Bipin Rajendran

Negative Electron Affinity Photocathodes		Francisco Machuca Katerina Ioakeimidi